Syarifah Norfaezah Sabki
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Preferred name
Syarifah Norfaezah Sabki
Official Name
Syarifah Norfaezah, Sabki
Alternative Name
Sabki, S. N.
Sabki, Syarifah N
Norfaezah Sabki, S
Sabki, Syarifah Norfaezah Binti
Main Affiliation
Scopus Author ID
35090423100
Researcher ID
GBY-6284-2022

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  • Publication
    A controlled growth of carbon nanofibers (CNFs) on graphene
    ( 2023-12)
    Mishtha Fiyatillah
    ;
    Syarifah Norfaezah Sabki
    ;
    Norzilah Abdul Halif
    ;
    L K Wisnu Kita
    ;
    Muhammad Asri Idris
    ;
    Noraini Othman
    ;
    A F Abd Rahim
    Carbon nanofibers (CNFs) have superior properties such as high conductivity, good mechanical strength, high specific surface area, and chemical stability. CNFs-graphene hybrid material can be used as a high-quality electrode in electronics applications. In the CNFs on graphene synthesis, the growth parameters must be well controlled. This work observes the evolution of the CNF's growth on graphene on Ni at reaction temperatures of 800oC and 860oC and at different reaction times of 30 min, 60 min, and 120 min. This research aims to find suitable conditions for obtaining controllable growth of CNFs on graphene. Based on the SEM measurement, it was found that the 860oC reaction temperature at 60 min and 120 min reaction time led to longer and smaller widths of CNFs with high coverage and distribution on graphene. The CNFs on graphene formation were confirmed by the XRD analysis.
  • Publication
    Impact of nanowire radius and channel thickness with high-k gate dielectric in GAA-JLT
    ( 2023-12)
    Nilaventhiran Vespanathan
    ;
    Noraini Othman
    ;
    Syarifah Norfaezah Sabki
    ;
    Alhan Farhanah Abd Rahim
    As the transistor’s size becomes smaller, degradation in the short-channel effects (SCEs) becomes more apparent. This leads to research work on multi-gate transistors such as the Fin-Field Effect Transistor (FinFET) and Gate-All-Around (GAA) transistor, where the 3D architecture have been shown to have superior performance as compared to conventional planar transistor. Transistor without junctions (JLT) which realizes a single type of doping has also been gaining popularity for biosensor applications due to its superior electrostatic performances in terms of Drain-Induced Barrier Lowering (DIBL), off-state leakage current (Ioff) and Subthreshold Slope (SS). In this work, the impact of changes in parameters such as the gate oxide material, nanowire radius and channel thickness toward the performance of a Gate-all-around JLT (GAA-JLT) have been studied using TCAD simulator. It was found that smaller nanowire radius and thicker channel produces lower DIBL, Ioff and SS, with the use of HfO2 as gate oxide materials shows better results than Si3N4. Meanwhile, the impact of parameters variations seemed to be negligible on the on-state current (Ion). The outcome of this work can be used as a basis to understand the impact of structural parameters variations towards the performance of a more complex GAA-JLT structure.