Home
  • English
  • ÄŒeÅ¡tina
  • Deutsch
  • Español
  • Français
  • Gàidhlig
  • LatvieÅ¡u
  • Magyar
  • Nederlands
  • Português
  • Português do Brasil
  • Suomi
  • Log In
    New user? Click here to register. Have you forgotten your password?
Home
  • Browse Our Collections
  • Publications
  • Researchers
  • Research Data
  • Institutions
  • Statistics
    • English
    • ÄŒeÅ¡tina
    • Deutsch
    • Español
    • Français
    • Gàidhlig
    • LatvieÅ¡u
    • Magyar
    • Nederlands
    • Português
    • Português do Brasil
    • Suomi
    • Log In
      New user? Click here to register. Have you forgotten your password?
  1. Home
  2. Resources
  3. Journals
  4. International Journal of Nanoelectronics and Materials (IJNeaM)
  5. Polysilicon nanowire with liquid gate control for pH sensing
 
Options

Polysilicon nanowire with liquid gate control for pH sensing

Journal
International Journal of Nanoelectronics and Materials (IJNeaM)
ISSN
1985-5761
Date Issued
2018-12
Author(s)
Mohammad Nuzaihan Md Nor
Universiti Malaysia Perlis
M. F. Farizal
School of Microelectronic Engineering
C. W. Chung
School of Microelectronic Engineering
M. N. Aziz
School of Microelectronic Engineering
Mohamad Faris Mohamad Fathil
Universiti Malaysia Perlis
C. Ibau
Universiti Malaysia Perlis
S. Johari
School of Microelectronic Engineering
Mohd Khairuddin Md Arshad
Universiti Malaysia Perlis
Handle (URI)
https://ijneam.unimap.edu.my/
https://ijneam.unimap.edu.my/images/PDF/IJNEAM%20SPECIAL%20ISSUE%20ICNE%20(DEC%2018)/Vol_11_SI_Dec18_145-152.pdf
https://hdl.handle.net/20.500.14170/13971
Abstract
Polysilicon nanowire based sensors have garnered great potential in serving as highly sensitive, label-free and real-time sensing for broad range of applications, that include but not limited to pH values, DNA molecules, proteins and single viruses. In this research, two distinct types of polysilicon nanowires are fabricated, one has an array of nanowires with a 100 nm width and the other is a single nanowire with 100 nm width. Top-down fabrication method is utilized to fabricate the polysilicon nanowire from silicon wafer using the conventional photolithography and reactive ion etching processes. The fabricated polysilicon nanowire have an approximately 100 nm in width, is then undergo surface modification, which is the nanowire is immersed into a 2% 3-aminopropyltriethoxysilane (APTES) to create a molecular binding chemistry, which results in amino (NH2) and silanol (SiOH) groups at the nanowire surface. Since the surface of the polysilicon is hole-dominated (p-type material), it responds well to changes in pH values. In this research, pH sensing is performed based on several types of standard aqueous pH buffer solutions (pH 2, pH 4, pH 7, pH 10 and pH 12) to demonstrate the electrical response of the sensor. At low pH, NH2 group is protonated, resulting in high proton ion acts as a positive gate. At high pH, SiOH group is deprotonated, resulting in bringing negative charges at the polysilicon nanowire surface and acts as a negative gate voltage. The sensitivity of the polysilicon nanowire attained was 207.1 fS/pH for array nanowire and 8.91 fS/pH for single nanowire, which shows excellent properties for pH sensing.
Subjects
  • Polysilicon nanowire

  • Ph sensing

  • Liquid gate control

  • Nanolithography

File(s)
Polysilicon Nanowire (866.29 KB)
google-scholar
Views
Downloads
  • About Us
  • Contact Us
  • Policies