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New approach for quality control in manufacturing process

Journal
AIP Conference Proceedings
ISSN
0094243X
Date Issued
2017-09-26
Author(s)
Hanzah M.R.B.
Rahim W.M.F.W.A.
Khor C.Y.
Ishak M.I.
Rosli M.U.
Jamalludin M.R.
Zakaria M.S.
Nawi M.A.M.
DOI
10.1063/1.5002263
Handle (URI)
https://hdl.handle.net/20.500.14170/11846
Abstract
This study was regulated exclusively in view of theoretical aspect and further research should be done to demonstrate it in the genuine circumstance. The structure of this investigation including two industrial visits, i.e. interviews and meeting with approved staff from each organization agents. This review is cut up into two sections. Aside from the perception, little gatherings with the staffs from both organizations are held. With the subtle elements, the review is begun up. The aim of the study is characterized as to enhance the assessment strategy at quality control station to minimize defect outflow to the following client. This is to investigate the underlying factor in ebb and flow quality control framework so that another strategy to enhance quality control framework can implemented. Quality is a basic characteristic to be instated so that the end goal to fulfill clients' need is achieved. After a long hypothetical review is made, the best answer for be actualized at QG station to beat defects outflow to the following customer is by photoelectric sensor. It is reasonable, simple to keep up and has a high affectability to identify the defective items at the QG station.
Funding(s)
Universiti Malaysia Perlis
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