Physical properties of CdO nano films deposited by pulsed laser deposition technique

In order to create CdO TCO's films, a pulsed laser (Nd: YAG) was utilized to ablate the target of CdO in the active environment with low oxygen pressure. The optimal substrate temperature was reached in this work by using pulsed laser deposition (PLD) to build cadmium oxide (CdO) nano-films at different substrate temperatures of 200, 300, and 400oC. The CdO target was exposed to a pulsed laser with energy of 1800 mJ at a standard wavelength of 1064 nm, pulse duration of 10 ns, and ablating CdO nano-grains on quartz substrates. The XRD result shows three main planes (111), (200), and (220), and also shows increase in the intensity of the peak for the plane of (111) at the space of the atomic of 2.744Å, where the XRD results shows, an increased in the crystallization with the increased the substrate temperatures. The morphological images show the best preparation condition at 300oC that are the average grain size of roughly 82.4 nm, and surface roughness accumulated to around 1.14 nm. The morphological and structural characteristics of the prepared nano-films are tested and examined at various substrate temperatures. The findings showed that the substrate temperatures were associated with a greater crystenality.