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  5. Substrate temperature and background pressure effects on nanostructured zinc oxide thin films for thermoelectric applications
 
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Substrate temperature and background pressure effects on nanostructured zinc oxide thin films for thermoelectric applications

Journal
International Journal of Nanoelectronics and Materials (IJNeaM)
ISSN
1985-5761
Date Issued
2015-01
Author(s)
Low Pei Ling
Multimedia University
Heng Meng Khen
Multimedia University
Tan Kwan Chu
Multimedia University
Devaraj Nisha Kumari
Multimedia University
Yap Seong Shan
Multimedia University
Ong Boon Hoong
Multimedia University
Tou Teck Yong
Multimedia University
Handle (URI)
https://ijneam.unimap.edu.my/
https://ijneam.unimap.edu.my/images/PDF/IJNEAM%20No.%201%202015/Vol%208_No%201_2_7-14.pdf
https://hdl.handle.net/20.500.14170/2738
Abstract
Zinc oxide (ZnO) thin films were grown on glass substrate by pulsed laser deposition (PLD) at different substrate temperature ranging from room temperature (RT) to 300ÂșC and various oxygen background pressures ranging from 14 mTorr to 140 mTorr, respectively. The structural, surface morphology and electrical properties of the ZnO films were investigated for thermoelectric (TE) applications. It was found that all of the fabricated ZnO films are preferentially in c-axis (002) orientation. Results showed that the electrical conductivity increased with higher substrate temperature and higher oxygen pressure. The high conductivity can be attributed to the increased grain size and surface roughness, which consequently reduced the grain boundary scattering.
Subjects
  • Thermoelectric

  • Zinc oxide

  • Thin film

  • Pulsed laser depositi...

File(s)
Substrate temperature and background pressure effects on nanostructured zinc oxide thin films for thermoelectric applications.pdf (299.54 KB)
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