In this manuscript, nano and micro silver peroxide and silver oxide thin films have been deposited and grown using a Reactive Pulse Laser Diode (RPLD) technique. The peroxide of silver has been deposited on p-silicon substrates. Annealing of the films has been taken under vacuum above (200⁰C -600 ⁰C) to produce oxide films. The I-V characteristics were investigated and discussed. The better reverse current has been changed from 20μA to 16mA in the graph of the curve of the I-V characteristics, the current had changed proportionally with voltage. The responsivity sensing had been sensed more optically for green (560nm) and near IR (840nm).