FTIR and X-ray diffraction analysis of Al2O3 nanostructured thin film prepared at low temperature using spray pyrolysis method
Journal
International Journal of Nanoelectronics and Materials (IJNeaM)
ISSN
1985-5761
Date Issued
2018-12
Author(s)
Saif A. Naayi
University of Technology, Baghdad
Azhar I. Hassan
University of Technology, Baghdad
Evan T. Salim
University of Technology, Baghdad
Abstract
Very simple and low-cost raw material was used to prepare Al2O3 nano-thin films Only Al(No3)3-9H2O and 2-methoxy ethanol were used to prepare the required thin films employing spray pyrolysis method at low substrate temperature. The FTIR results ensure the formation of the Al-O bond which appears at different absorption peaks. Effect of substrate temperatures reveals the dependence of Al-O bond formation on the variation of substrate temperatures from 200 up to 400oC. This was confirmed by the x-ray diffraction results which ensure the formation of the Al2O3 amorphous structure. SEM results insure the formation of nanostructure Al2O3 thin films.