Titanium dioxide (TiO₂) is a widely available transparent conducting oxide (TCO). In recent years it attracted the attention of researchers due to its compatibility with several applications. To achieve the best TiO₂ thin film properties possible, the deposition parameters must be optimized. In this research, TiO₂ was deposited on silicon and quarts by pulsed laser deposition (PLD) technique aiming to study the effect of changing the energy of the PLD Nd-YAG laser between 500, 600, and 700mJ. The optical properties have been investigated using a UV-Vis spectrophotometer, morphological properties using Atomic Force Microscopy, and structural properties using an X-ray diffractometer and Raman spectrometer. 700mJ was proven to provide the best thin film properties, the tests and measurements have shown a crystalline structure, and the distribution of the grains was regularly in the film. Raman spectroscopy showed two diffraction peaks corresponding to anatase Eg and rutile Eg. This observation is typically used in dye-sensitized solar cells, separation sensor devices, and more.
