Home
  • English
  • ÄŒeÅ¡tina
  • Deutsch
  • Español
  • Français
  • Gàidhlig
  • LatvieÅ¡u
  • Magyar
  • Nederlands
  • Português
  • Português do Brasil
  • Suomi
  • Log In
    New user? Click here to register. Have you forgotten your password?
Home
  • Browse Our Collections
  • Publications
  • Researchers
  • Research Data
  • Institutions
  • Statistics
    • English
    • ÄŒeÅ¡tina
    • Deutsch
    • Español
    • Français
    • Gàidhlig
    • LatvieÅ¡u
    • Magyar
    • Nederlands
    • Português
    • Português do Brasil
    • Suomi
    • Log In
      New user? Click here to register. Have you forgotten your password?
  1. Home
  2. Resources
  3. Journals
  4. International Journal of Nanoelectronics and Materials (IJNeaM)
  5. A comparative study of electronic and thermoelectric properties of bulk, 2D sheet and 1D wire of Silicon: an ab-initio study
 
Options

A comparative study of electronic and thermoelectric properties of bulk, 2D sheet and 1D wire of Silicon: an ab-initio study

Journal
International Journal of Nanoelectronics and Materials (IJNeaM)
ISSN
1985-5761
Date Issued
2017-07
Author(s)
H. Joshi
Mizoram University, India
D. P. Rai
Pachhunga University College, India
Sandeep
Mizoram University, India
A. Shankar
North Bengal University, India
P. K. Patra
NEHU Shillong, India
R. K. Thapa
Mizoram University, India
Abstract
We have made a comparative study of the electronic and thermoelectric properties of bulk, 2D-sheet and 1D atomic wire of Silicon, using the Full Potential Linearized Augmented Plane Wave method (FP-LAPW) within the framework of DFT. The electron exchange correlation was treated with the modified Becke-Johnson exchange potential (PBmBJ) for bulk Silicon and for Si sheet and wire, the most common Generalized Gradient Approximation (GGA) is taken into consideration. The transport coefficients were calculated by a post DFT treatment which involved the semi-classical Boltzmann Theory as implemented in the code BoltzTraP. For Si, we observed that as we move towards lower dimensionality, the thermoelectric efficiency ZT increases significantly (bulk ~ 0.01, Si sheet ~ 1.1 and Si wire ~ 1.65 at 300 K). The increase in ZT is mostly due to the change in phase in going from higher to lower dimension, which increases the electrical conductivity and reduces the thermal conductivity. Results obtained are compared with available theoretical and experimental results.
Subjects
  • Thermoelectric proper...

  • 1D atomic silicon

  • 2D sheet silicon

  • FP-LAPW

  • DFT

  • Becke-Johnson exchang...

  • BoltzTraP

File(s)
A comparative study of electronic and thermoelectric properties (646.23 KB)
google-scholar
Views
Downloads
  • About Us
  • Contact Us
  • Policies