Uda Hashim
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Preferred name
Uda Hashim
Official Name
Uda, Hashim
Alternative Name
Hashimb, U.
Hashim, Uda
Hashim, U.
Uda, Hashim
Main Affiliation
Scopus Author ID
22633937800
Researcher ID
CVC-6955-2022

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Improvement in processing of micro and nano structure fabrication using O2 plasma

2011-01 , Th. S. Dhahi , Uda Hashim , N. M. Ahmed

Plasma has frequently been used by the industry as a last step surface preparation technique in an otherwise wet-etched process. Recent research of the chemistry of plasma led to a great understanding of plasma processes. It is by controlling the plasma conditions and gas mixture, ultra-fast plasma cleaning and etching is possible. With enhanced organic removal rates, plasma processed become more desirable as an environmentally sound alternative to traditional solvent or acid dominated process, not only as a cleaning tool, but also as a patterning and machining tool. In this paper, improvement in the processing of nanogap fabrication using Oâ‚‚ plasma is discussed including the parameters for PR patterning with two times limited in the Oâ‚‚ plasma process. For applications that have not been possible with limited usefulness, plasma processes are now approaching the realm of possibility. We introduce this work to fabricate and characterize the nanogap device fabrication Oâ‚‚ plasma technique for biosensor fabrication. In this review, two masks design are proposed. The first mask is for the lateral nanogap and the second mask is for a gold pad electrode pattern, and the lateral nanogap is introduced in the fabrication process using silicon, and gold as an electrode. Conventional photolithography technique is used to fabricate this nanogap (NG) based on the plasma etching technique. The increase in etching time when we apply the Oâ‚‚ plasma means an increase in the amount of etching, while in the case of reducing the time of etching means reducing the amount of etching, as shown in the results.

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Publication

Improvement in processing of micro and nano Structure fabrication using Oâ‚‚ plasma

2011-01 , Th. S. Dhahi , Uda Hashim , N. M. Ahmed

Plasma has frequently been used by the industry as a last step surface preparation technique in an otherwise wet-etched process. Recent research of the chemistry of plasma led to a great understanding of plasma processes. It is by controlling the plasma conditions and gas mixture, ultra-fast plasma cleaning and etching is possible. With enhanced organic removal rates, plasma processed become more desirable as an environmentally sound alternative to traditional solvent or acid dominated process, not only as a cleaning tool, but also as a patterning and machining tool. In this paper, improvement in the processing of nanogap fabrication using Oâ‚‚ plasma is discussed including the parameters for PR patterning with two times limited in the Oâ‚‚ plasma process. For applications that have not been possible with limited usefulness, plasma processes are now approaching the realm of possibility. We introduce this work to fabricate and characterize the nanogap device fabrication Oâ‚‚ plasma technique for biosensor fabrication. In this review, two masks design are proposed. The first mask is for the lateral nanogap and the second mask is for a gold pad electrode pattern, and the lateral nanogap is introduced in the fabrication process using silicon, and gold as an electrode. Conventional photolithography technique is used to fabricate this nanogap (NG) based on the plasma etching technique. The increase in etching time when we apply the Oâ‚‚ plasma means an increase in the amount of etching, while in the case of reducing the time of etching means reducing the amount of etching, as shown in the results.

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Precise alignment of individual single-walled carbon nanotube using dielectrophoresis method for development and fabrication of pH sensor

2013 , Uda Hashim , Foo Wah Low , Liu Wei Wen

Development and fabrication of single-walled carbon nanotube (SWNT) based pH sensor were reported. The precise alignment of individual SWNT using dielectrophoresis method between the two microgap electrodes was conducted, and the effects of precise alignment of individual SWNT on impedance, long term stability, and capacitance of the sensor were studied. The pH sensor was fabricated using conventional photolithography and wet etching process. The impedance values were found to decrease in the order of distilled water > pH 10 > pH 5 > pH 3 > air. Without the alignment of SWNT, the capacitances values decreased with increasing of pH values at low frequency. All the impedance and capacitance results were highly repeatable.

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Titanium dioxide (TiO2) doped reduced graphene oxide (rGO) with different dye for solar cell application

2020-01-01 , Uda, Muhammad Nur Afnan , Asral Bahari Jambek , Uda Hashim , Muhammad Nur Aiman Uda

In the present work, the surface morphology and electrical characteristic of different doping ratio of reduced Graphene Oxide (rGO) in Titanium Oxide solution with different organic dyes (turmeric and beetroot) were studied. The Titanium Dioxide (TiO2) solution and reduced Graphene Oxides (rGO) were synthesized by using precipitation-peptization method and chemical reagent, respectively. The TiO2-rGO thin film was deposited on the glass substrate by using doctorblade technique. The surface morphology and electrical characteristic were measured by using Scanning Electron Microscope (SEM) and Keitheley 2450 Source Meter, respectively. Experimental results showed that 0.3 wt% rGO with turmeric dye resulted the highest value of open voltage (Voc) and short circuit current (Isc) of Dye-sensitized Solar Cells (DSSC).

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