Publication:
Effect of hydrothermal reaction time and etching on nanorod TiO₂ thin film

cris.virtual.department Universiti Malaysia Perlis
cris.virtualsource.department 700875c8-4d19-4255-8143-1b8dbb168f19
dc.contributor.author Muhammad Zuhairi Zulkifli
dc.contributor.author Fariza Mohamad
dc.contributor.author Shazleen Ahmad Ramli
dc.contributor.author Nurliyana Mohamad Arifin
dc.contributor.author Mohd Khairul Ahmad
dc.contributor.author Nik Hisyamudin Muhd Nor
dc.contributor.author Mohd Zamzuri Mohammad Zain
dc.contributor.author Masanobu Izaki
dc.date.accessioned 2026-01-23T07:42:52Z
dc.date.available 2026-01-23T07:42:52Z
dc.date.issued 2025-03
dc.description.abstract Titanium dioxide (TiO₂) has the most potential function in numerous research domains because of its various advantages. Among the variety of ways, TiO₂ nanorods (TNRs) are one of interest nanoparticle structures due to their superior delocalisation of the electron holes pair and lower charge recombination. However, TNRs inhibit solar spectrum absorption and have a high resistivity. In this study, etching treatment is introduced to increase the specific surface area and reduce resistivity. The effect of reaction time was investigated on TNRs thin film by using the hydrothermal method. From the findings, the 8-hour reaction time of TNRs thin film revealed the most striking characteristics. The preferred (101)-orientation of TNRs was observed and the diameter of rods increased along with reaction time. As the reaction time rises, the bandgap energy of TNRs approaches the value of 3.0 eV and presents a compact surface. After etching treatment, the peak intensity of (101)-orientation of TNRs increases indicating high crystallinity. The morphology of nanorods changed into smaller rods, apparently a nanowire with deeper depth. The surface roughness and band gap increased due to the surface area affected by etching. The electrical properties of etched-TNRs thin film after showed a reduction of resistivity aligning to thickness decrement. Thus, hydrothermal etching treatment showed effectiveness in enhancing TNRs properties in terms of crystallinity, surface morphology and reducing resistivity.
dc.identifier.doi 10.37934/aram.127.1.120135
dc.identifier.uri https://semarakilmu.com.my/journals/index.php/appl_mech/article/view/4836
dc.identifier.uri https://semarakilmu.com.my/
dc.identifier.uri https://hdl.handle.net/20.500.14170/15849
dc.language.iso en
dc.publisher Semarak Ilmu Publishing
dc.relation.ispartof Journal of Advanced Research in Applied Mechanics
dc.relation.issn 2289-7895
dc.subject FTO
dc.subject TNRs
dc.subject TiO₂
dc.subject Hydrothermal
dc.subject Etching treatment
dc.subject Etched-TNRs
dc.title Effect of hydrothermal reaction time and etching on nanorod TiO₂ thin film
dc.type journal-article
dspace.entity.type Publication
oaire.citation.endPage 135
oaire.citation.issue 1
oaire.citation.startPage 120
oaire.citation.volume 127
oairecerif.author.affiliation Universiti Tun Hussein Onn Malaysia
oairecerif.author.affiliation Universiti Tun Hussein Onn Malaysia
oairecerif.author.affiliation Universiti Tun Hussein Onn Malaysia
oairecerif.author.affiliation MILA University
oairecerif.author.affiliation Universiti Tun Hussein Onn Malaysia
oairecerif.author.affiliation Universiti Tun Hussein Onn Malaysia
oairecerif.author.affiliation Universiti Malaysia Perlis
oairecerif.author.affiliation National Institute of Technology, Japan
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