Uda Hashim
No Thumbnail Available
Preferred name
Uda Hashim
Official Name
Uda, Hashim
Alternative Name
Hashimb, U.
Hashim, Uda
Hashim, U.
Uda, Hashim
Main Affiliation
Scopus Author ID
22633937800
Researcher ID
CVC-6955-2022

Research Output

journal article journal ar...

Filters

3
3
3
Reset filters

Settings
Now showing 1 - 3 of 3
  • Publication
    From nanostructure to nano biosensor: Institute of Nano Electronic Engineering (INEE), UniMAP experience
    ( 2011)
    Uda Hashim
    ;
    Foo Kai Loong
    Nanostructure is defined as something that has a physical dimension smaller than 100 nanometers, ranging from clusters and/or to dimensional layers of atoms. There are three most important nanostructures that are extensively studied and researched in various organizations including Institute of Nano Electronic Engineering (INEE) in UniMAP. These include quantum dot, nanowire, and nanogap, which have been successfully designed and fabricated using in-house facilities available. These are subsequently used as a main sensing component in nanostructures based biosensor. This fabrication, characterization and testing job were done within four main interlinked laboratories namely microfabrication cleanroom, nanofabrication cleanroom, failure analysis laboratory and nano biochip laboratory. Currently, development of Nano Biosensor is the main research focus in INEE. In principle, biosensor is an analytical device which converts a biological response into an electrical signal.
  • Publication
    Improvement in processing of micro and nano structure fabrication using O2 plasma
    ( 2011-01)
    Th. S. Dhahi
    ;
    Uda Hashim
    ;
    N. M. Ahmed
    Plasma has frequently been used by the industry as a last step surface preparation technique in an otherwise wet-etched process. Recent research of the chemistry of plasma led to a great understanding of plasma processes. It is by controlling the plasma conditions and gas mixture, ultra-fast plasma cleaning and etching is possible. With enhanced organic removal rates, plasma processed become more desirable as an environmentally sound alternative to traditional solvent or acid dominated process, not only as a cleaning tool, but also as a patterning and machining tool. In this paper, improvement in the processing of nanogap fabrication using Oâ‚‚ plasma is discussed including the parameters for PR patterning with two times limited in the Oâ‚‚ plasma process. For applications that have not been possible with limited usefulness, plasma processes are now approaching the realm of possibility. We introduce this work to fabricate and characterize the nanogap device fabrication Oâ‚‚ plasma technique for biosensor fabrication. In this review, two masks design are proposed. The first mask is for the lateral nanogap and the second mask is for a gold pad electrode pattern, and the lateral nanogap is introduced in the fabrication process using silicon, and gold as an electrode. Conventional photolithography technique is used to fabricate this nanogap (NG) based on the plasma etching technique. The increase in etching time when we apply the Oâ‚‚ plasma means an increase in the amount of etching, while in the case of reducing the time of etching means reducing the amount of etching, as shown in the results.
      4  12
  • Publication
    Improvement in processing of micro and nano Structure fabrication using Oâ‚‚ plasma
    ( 2011-01)
    Th. S. Dhahi
    ;
    Uda Hashim
    ;
    N. M. Ahmed
    Plasma has frequently been used by the industry as a last step surface preparation technique in an otherwise wet-etched process. Recent research of the chemistry of plasma led to a great understanding of plasma processes. It is by controlling the plasma conditions and gas mixture, ultra-fast plasma cleaning and etching is possible. With enhanced organic removal rates, plasma processed become more desirable as an environmentally sound alternative to traditional solvent or acid dominated process, not only as a cleaning tool, but also as a patterning and machining tool. In this paper, improvement in the processing of nanogap fabrication using Oâ‚‚ plasma is discussed including the parameters for PR patterning with two times limited in the Oâ‚‚ plasma process. For applications that have not been possible with limited usefulness, plasma processes are now approaching the realm of possibility. We introduce this work to fabricate and characterize the nanogap device fabrication Oâ‚‚ plasma technique for biosensor fabrication. In this review, two masks design are proposed. The first mask is for the lateral nanogap and the second mask is for a gold pad electrode pattern, and the lateral nanogap is introduced in the fabrication process using silicon, and gold as an electrode. Conventional photolithography technique is used to fabricate this nanogap (NG) based on the plasma etching technique. The increase in etching time when we apply the Oâ‚‚ plasma means an increase in the amount of etching, while in the case of reducing the time of etching means reducing the amount of etching, as shown in the results.
      2  18