Embracing physical vapor deposition system, GLAD method defines the deposition angle, α, in terms of vapor flux and normal substrate. The substrate rotation angle, φ, defines the azimuthal substrate position relative to an arbitrary starting position. We have fabricated periodic nanostructure through utilizing GLAD to control the film deposition conditions over these arrays. Manganese chiral single ring nanostructure has been created using oblique angle deposition method in conjunction with rotation of normal surface substrate. Employing AFM measurement and J-Microvision software, we obtained structure morphology, the size of grains, surface physical roughness and surface void fraction. The optical spectra of the samples were obtained using a single beam spectrophotometer for the incident light of the surface normal. Moreover, it should be mentioned here that Fresnel formulas and experimental measurements of reflectance and absorption spectra could be applied to obtain the refractive index n and the absorption index k. Since Manganese chiral single ring of fabricated nanostructure with GLAD technique is porous, the plot of the refractive index that was observed as a function of the wavelength index aspect has lower values in comparison with homogeneous Manganese thin film associated with longer wavelengths. Therefore, we can control the refractive index of nanostructure with regard to the film density and porous. It is suggested that GLAD may offer an effective method to attain tailor able refractive index.
