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  1. Home
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  5. Fabrication of 110 Silicon Nanowire Oriented with Direct Band Gap
 
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Fabrication of 110 Silicon Nanowire Oriented with Direct Band Gap

Journal
IOP Conference Series: Materials Science and Engineering
ISSN
17578981
Date Issued
2020-12-18
Author(s)
Tijjani Adam
Universiti Malaysia Perlis
Dhahi T.S.
University of Basra, Iraq
Khairul Affendi Rosli
Universiti Malaysia Perlis
Jaafar M.
Arizona State University, United States
Jaafar R.
Arizona State University, United States
Mohd Fikri Che Husin
Universiti Malaysia Perlis
Mohd Norhafiz Hashim
Universiti Malaysia Perlis
Mohamad Rizal Abdul Rejab
Universiti Malaysia Perlis
DOI
10.1088/1757-899X/932/1/012094
Handle (URI)
https://iopscience.iop.org/article/10.1088/1757-899X/932/1/012094
Abstract
Today, the challenges of getting fast switching semiconductor device based device is the phonon generation mechanism for light-emitting by device such as diodes. The increase in efficiency of the device determine by the green light part of the emitted light spectrum. Silicon nanowire growth in the direction of 110 structure has indirect band gap, which tremendously improved the green emission efficiency at the lower Nano regime. Several band structure calculations have be predicted direct band for 110 growth silicon nanowire. Thus, the study report the fabrication of silicon nanowires with diameter between 20 to 50nm which demonstrate the direct nature of the band gap. A strong photoluminescence at wave spectrum of 597 nm with micro-second lifetime indicating it direct band gap. This study have demonstrated new nanostructure engineering based on silicon nanowire orientation which will allow new ways getting silicon nanowire functionality.
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Fabrication of 110 Silicon Nanowire Oriented with Direct Band Gap.pdf (59.05 KB)
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